Patents, Journals & Conferences

PATENTS

1. Highly Sensitive MAPDSM-MAPDST based Resists Technology for Next Generation Lithography; Inventors: Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal, Pawan Kumar. (Application number: 201611022219A).

2. Poly alkyl sulfide (PAS) synthesis, characterization and its UV-365 nm lithography patterning; Inventors: Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal, Pawan Kumar.

3. Resist Technology Based on Polyarylene sulphide. (PAS) as a Unique Polymer Material for Semiconductor Fabrication Technology. 2) K. E. Gonsalves, S. Ghosh, C. P. Pradeep, P. G. Reddy, S. K. Sharma, S. P. Pal (Application number: IN 2016-11018061)

4. A One Step, Low Temperature, Cost Effective, Photo-Chemical Reduction of Graphene Oxide Dispersions for the Commercial Scale Analogous reduced graphene oxide (αr-GO) Production. Inventors: Satinder K. Sharma, M. Soni, P. Kumar, A. Soni.(Application Number:- 201611028125).

5. A New Class of Non-Chemically Amplified Molecular Photoresists for Next Generation Integrated Circuits (ICs) Technology. Inventors: Kenneth E Gonsalves; Subrata Ghosh; Pradeep Parameswaran; Satinder K. Sharma; Neha Thakur; Pulikanti Guru Prasad Reddy; Santu Nandi; Midathala Yogesh; (Application number: 201611044190)

6. Conceptual Hybrid Nano Photoresists for Sub-7 nm Node Patterning Applications. Inventors: P. Guru Prasad Reddy, Kenneth E. Gonsalves, Subrata Ghosh, Satinder K. Sharma, Chullikkattil P. Pradeep

JOURNALS

 –    Upcoming

82.  Low Voltage Operation and High Mobility with Nitrogen Functionalized Reduced Graphene Oxide-based Organic Transistors for Flexible Electronic Circuits Mahesh Soni, Ajay Soni, Satinder K. Sharma; communicated to IEEE Transaction Nanotechnology.

81.  Reduced Switching Mode for a SAR ADC: Analysis and Design of a SAR A-to-D Algorithm with periodic Stand-by Mode Circuit Components Ashish Joshi, Hitesh Shrimali, and Satinder K. Sharma; communicated to IET Circuits, Devices & Systems, 2019.

80.  Chopper Stabilized Amplifier Using a Discrete Time Parametric Amplifier Demodulator Ashish Joshi, Hitesh Shrimali, and Satinder K. Sharma; communicated in IEEE Solid State Letters, 2019.

79.  Self-calibrated and Digitally Assisted Comparator with Supplementary LSB Generation Ashish Joshi, Hitesh Shrimali, and Satinder K. Sharma; communicated in IET Electronics Letters, 2019

78.  Z-axis MEMS Accelerometers using SU-8, PolySi, Si3N4 and SiC based structural materials Mandeep Jangra, Robin Khosla, and Satinder K. Sharma; communicated to IEEE Sensors Journal.

77.  Few layer NrGO Floating Gate and Ultra thin SiOXNY Tunneling layer based Al/PMMA/ NrGO/SiOXNY/p-Si/Au gate stack for Reliability Analysis of Flash Memory  Mahesh Soni, Ajay Soni, and Satinder K. Sharma; communicated to Journal of Vacuum Science & Technology-B (JVST-B).

76.  Ferroelectric Materials: An Ultimate Solution for Next Generation Universal Memories Robin Khosla and Satinder K. Sharma; communicated to Journal of Materials Research Bulletin.

75.  Nitrogen-Doped Reduced Graphene Oxide based exalted Glassy Carbon Electrode for Electrochemical Sensing of Dopamine Richa Soni, Kumar Palit, Mahesh Soni, Satinder K. Sharma; communicated to Journal of Soft Matter.

74.  Highly Sensitive SERS Sensors Based on Ag coated Self Assembled Colloidal Crystals for Detection of Contaminants in Water Pawan Kumar, Mahesh Soni, Tarun Arora, Robin Khosla and Satinder K. Sharma; communicated to Advanced Materials Letters.

–    2019

73.  Room temperature ammonia gas sensor using Meta Toluic acid functionalized graphene oxide Ravi Kumar, Anil Kumar, Rakesh Singh, Rajesh kashyap, Rajiv Kumar, Dinesh Kumar, Satinder K. Sharma, Mukesh Kumar, Materials Chemistry and Physics 240, 121922, 2019; 10.1016/j.matchemphys.2019.121922.

72.  Low-Current-Density Magnetic Tunnel Junctions for STT-RAM Application Using MgOxN1?x (x = 0.57) Tunnel Barrier M. G. Moinuddin, Aijaz. H. Lone, Shivangi Shringi, Srikant Srinivasan and Satinder K Sharma, IEEE Transactions on Electron Devices, 2019; 10.1109/TED.2019.2954131.

71.  Alternate lanthanum oxide/silicon oxynitride-based gate stack performance enhancement due to ultrathin oxynitride interfacial layer for CMOS applications Prachi Gupta, Mahesh Soni, Satinder K. Sharma; Journal of Materials Science: Materials in Electronics,vol 31, pp-1986-1995, Dec 2019; 10.1007/s10854-019-02718-7.

70.  Impact of annealing temperature on band-alignment of PLD grown Ga2O3/Si (100) heterointerface Manoj K. Yadav, Arnab Mondal, Subhashis Das, Satinder K. Sharma, Ankush Bag, Journal of Alloys and Compounds; 153052, 16 November 2019; 10.1016/j.jallcom.2019.153052.

69.  Realization of large area Co20Fe60B20 based p-magnetic tunnel junction for CMOS compatible device application Mohamad G. Moinuddin, Aijaz Lone, Srikant Srinivasan, and Satinder K. Sharma, ACS Applied Electronic Materials, 2019; 10.1021/acsaelm.9b00469.

68.  Realization and Performance Analysis of Facile Processed µ-IDE based multi-layer HfS2/HfO2 Transistors Shivani Sharma, Subhashis Das, Robin Khosla, Hitesh Shrimali, Satinder K. Sharma; IEEE Transaction on Electron Devices, Volume: 66, Issue: 7, July 2019; 10.1109/TED.2019.2917323.

67.  Facile Synthesis of 2D-HfS2 Flakes/?-IDE based Highly Sensitive and Selective Sensor or Methanol Sensing Application at Room Temperature Subhashis Das, Shivani Sharma and Satinder K. Sharma; IEEE Sensors Journal, 26 June 2019; 10.1109/JSEN.2019.2925027.

66.  Low Voltage & Controlled Switching of MoS2-GO Resistive Layers based ReRAM for Non-Volatile Memory Applications Sumit Choudhary, Mahesh Soni, and Satinder K. Sharma; Semicond. Sci. Technol.34, 085009, 11pp, 2019; 10.1088/1361-6641/ab2c09.

65.  Highly UV sensitive Sn Nanoparticles blended with polyaniline onto Micro-Interdigitated Electrode Array for UV-C detection applications Shivani Sharma, Subhashis Das, Robin Khosla, Hitesh Shrimali, and Satinder K. Sharma; Journal of Materials Science: Materials in Electronics; April 2019, Volume 30, Issue 8, pp 7534-7542, 2019; 10.1007/s10854-019-01067-9. 

– 2018

64.  Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications Pulikanti Guruprasad Reddy, M. G. Moinuddin, Aneesh M. Joseph,Santu Nandi,Midathala Yogesh,Subrata Ghosh,Chullikkattil P. Pradeep , Satinder K. Sharma, Kenneth E. Gonsalves; Journal of Photopolymer Science and Technology, Volume 31, Number 6, pp-669-678, 2018; 10.2494/photopolymer.31.669.

63.  Evaluation of high-resolution and sensitivity of n-CAR hybrid resist for sub-16nm or below technology node Satinder K. Sharma, Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Chullikkattil P. Pradeep, Subrata Ghosh, and Kenneth E. Gonsalves; Proc. SPIE 10583, Extreme Ultraviolet (EUV) Lithography IX, 105831Q, SPIE Advanced Lithography, 2018; 10.1117/12.2297565.

62.  Integration of graphene oxide buffer layer/graphene floating gate for wide memory window in Pt/Ti/Al2O3/GO/graphene/SiO2/p-Si/Au non-volatile (FLASH) applications Mahesh Soni, Ajay Soni, and Satinder K. Sharma, Applied Physics Letters, 112, 252102, 2018; 10.1063/1.5030020.

61.  Helium ion active hybrid non-chemically amplified resist (n-CAR) for sub-10 nm patterning applications Satinder K. Sharma, Pulikanti Guruprasad Reddy, Mohamad Ghulam Moinuddin, Subrata Ghosh, Chullikkattil P. Pradeep, and Kenneth E. Gonsalves; Proc. SPIE 10584, Emerging Patterning Technologies, 1058409, SPIE Advanced Lithography, 2018; 10.1117/12.2297537.

60.  High-Performance CSA-PANI based Organic Phototransistor by Elastomer Gratings Shivani Sharma, Robin Khosla, Subhashis Das, Hitesh Shrimali, and Satinder K. Sharma; Journal of Organic Electronics, vol 57; pp-14-20, 2018; 10.1016/j.orgel.2018.02.031.

59.  Investigations on structural, optical and magnetic properties of Fe and Dy co-doped ZnO nanoparticles Jaskaran Singh; Arun Kumar Singh; Robin Khosla; Satinder K. Sharma; Gyaneshwar Sharma; Sanjeev Kumar; Journal of Materials Science: Materials in Electronics, vol 29, pp-850-385, 2018; 10.1007/s10854-017-8321-4.

58.  Scalable and site-specific functionalization of reduced graphene oxide for circuit elements and flexible electronics Mahesh Soni, Pawan Kumar, Juhi Pandey, Satinder K. Sharma, Ajay Soni; Carbon; Vol. 128, Pages 172-178, 2018; 10.1016/j.carbon.2017.11.087.

57.  Frequency Dispersion and Efficient Capacitance Correction Method in High-? MOS Capacitors based on C-V and C-F Measurements Robin Khosla and Satinder K. Sharma; Journal of Vacuum Science & Technology-B (JVST-B); vol 36, 012201, 2018; 10.1116/1.4995809.

56.  Enhanced nano-mechanical properties of the high-resolution EUVL patterns of MAPDSA-MAPDST resists containing hexafluoro antimonatePawan Kumar, Pulikanti Guru Prasad Reddy, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves; Journal of Microelectronics Engineering, 2018; 10.1016/j.mee.2018.03.014.

– 2017

55.  Design of a Charge Sensitive Amplifier for Particle Detection Application in BCD 180 nm Technology H.Shrimali, A.Joshi, E. Ruscio, I. Yadav, Satinder K. Sharma, V. Liberali, and A. Andreazza; Journal of Instrumentation; JINST_018P_0917; September 7, 2017.

54.  New non-chemically amplified molecular resist design with switchable sensitivity for multi-lithography applications and nanopatterning Neha Thakur; Pulikanti Reddy, Nandi Santu, Yogesh, Midathala; Satinder K. Sharma, Chullikkattil Pradeep, Subrata Ghosh, Kenneth Gonsalves, Journal of Micromechanics and Microengineering, IOP Science, 2017; 10.1088/1361-6439/aa8751.

53.  Organic-Inorganic Hybrid Photoresists Containing Hexafluoroantimonate: Design, Synthesis and High-Resolution EUV Lithography Studies Pulikanti Guruprasad Reddy, Pawan Kumar, Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma, and Kenneth E. Gonsalves; Materials Chemistry Frontiers, 2017; 10.1039/c7qm00343a.

52.  Nitrogen-Doped Multilayer Photo Catalytically Reduced Graphene Oxide Floating Gate: Al/PMMA/NrGO/SiO2/p-Si/Au based Hybrid Gate Stack for Non-Volatile Memory Applications Mahesh Soni, Ajay Soni, Satinder K. Sharma; Journal of Organic Electronics, vol 51, 2017; 10.1016/j.orgel.2017.09.011.

51.  Photoacid generator integrated terpolymer for electron beam lithography applications: sensitive resist with pattern transfer potential Santu Nandi, Midathala Yogesh, P. Guru Prasad Reddy, Satinder K. Sharma, Chullikkattil P. Pradeep, Subrata Ghosh and Kenneth E Gonsalves; Mater.Chem.Front., vol 1, pp-1895-1899, 2017; 10.1039/C7QM00140A.

50.  Highly-Sensitive Surface-Enhanced Raman Scattering (SERS) based Multi-Gas Sensor: Au nanoparticles decorated on partially embedded 2D colloidal crystals into elastomer Satinder K. Sharma, Pawan Kumar, Sumit Barthwal, Seema Sharma and Ashutosh Sharma, Chemistry Select, vol 2, pp-6961-6969, 2017; 10.1002/slct.201701204.

49.  Fluorine-Chlorine co-doped TiO2/CSA doped Polyaniline based high-performance inorganic/organic hybrid heterostructure for UV photodetection applications Shivani Sharma, Robin Khosla, Dinesh Deva, Hitesh Shrimali and Satinder K. Sharma; Sensors and Actuators A Physical, 261, April 2017; 10.1016/j.sna.2017.04.043.

48.  Photo-Catalytic Reduction of Oxygenated Graphene Dispersions for Supercapacitor Applications Mahesh Soni, Pawan Kumar, Rudra Kumar, Satinder K. Sharma and Ajay Soni; Journal of Physics. D: Appl. Phys.,vol 50, 124003, 8pp, 2017; 10.1088/1361-6463/aa5c9f.

47.  Polyarylenesulfonium salt as a novel and versatile non-chemically amplified negative tone photoresist for high-resolution EUV lithography applications Pulikanti Guruprasad Reddy, Satyendra Prakash Pal, Pawan Kumar, Chullikkattil P. Pradeep, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves; ACS Appl. Mater. Interfaces, vol 9 (1), pp 17-21, 2017; 10.1021/acsami.6b10384.

46.  A Systematic Design Approach for a Gain Boosted Telescopic OTA with Cross Coupled Capacitor Ashish Joshi, Hitesh Shrimali and Satinder K. Sharma; IET Circuits, Devices & Systems, Vol. 11 Iss. 3, pp. 225-231, 2017. 10.1049/iet-cds.2016.0448.

45.  Selective detection of F? using Al microarrays integrated graphene oxide M. Soni, P. Kumar, A. Soni, Satinder K. Sharma; Sensors and Actuators B: Chemical, Volume 247, Pages 224-227, 2017; 10.1016/j.snb.2017.02.142.

44.  A highly sensitive, flexible SERS sensor for malachite green detection based on Ag decorated microstructured PDMS substrate fabricated from Taro leaf as a template Pawan Kumar, Robin Khosla, Mahesh Soni, Dinesh Deva and Satinder K. Sharma; Sensor and Actuators B: Chemical, Volume 246, Pages 477-486, 2017; 10.1016/j.snb.2017.01.202.

43.  Charge Trapping Analysis of Metal/Al2O3/SiO2/Si, gate stack for emerging embedded memories Robin Khosla, Erlend Rolseth, Pawan Kumar, Senthil Srinivasan V Palayam, Satinder K. Sharma and Jörg Schulze; IEEE Transactions on Device and Materials Reliability, Volume: 17, Issue: 1, March 2017; 10.1109/TDMR.2017.2659760.

  – 2016

42.  Design and Development of Low Activation Energy based Non Chemically Amplified (n-CARs) Resists for Next Generation EUV Lithography Satinder K. Sharma, Satyendra Prakash Pal, Pulikanti Guruprasad Reddy, Pawan Kumar, Subrata Ghosh and Kenneth E. Gonsalves, Microelectronic Engineering, vol 164, pp-115-122, 2016; 10.1016/j.mee.2016.07.017.

41.  Recent advances in non-chemically amplified photoresists for next generation IC technology Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma, Pulikanti Guruprasad Reddy, Satyendra P. Pal and Kenneth E. Gonsalves; RSC Adv., vol 6, pp-74462-74481, 2016, Impact factor 3.3; 10.1039/C6RA12077F.

40.  Surface Potential Investigations of Post Deposition Annealed Er2O3 films by Kelvin Probe Force Microscopy for Scaled Memory Device Applications Pawan Kumar, Robin Khosla, Satinder K. Sharma; Surface and Interfaces, vol 4, pp-69-76, 2016; 10.1016/j.surfin.2016.08.003.

39.  Design, development and nano mechanical investigations of a new organic monomer and HfO2 nano-particles based hybrid resist for EUVL applications Pulikanti Guruprasad Reddy, Narsimha Mamidi, Pawan Kumar, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, Chullikkattil P. Pradeep; RSC Adv., vol 6, pp-67143-67149, 2016, Impact factor 3.3; 10.1039/C6RA10575K.

38.  Patterning highly ordered arrays of complex nanofeatures through EUV directed polarity switching of non-chemically amplified photoresist Subrata Ghosh, V. S. V. Satyanarayana, Bulti Pramanick, Satinder K. Sharma, Chullikkattil P. Pradeep, Israel Morales-Reyes, Nikola Batina, Kenneth E. Gonsalves; Nature, Scientific Reports, vol 6, pp-22664, 2016; 10.1038/srep22664.

37.  Integration of Highly Sensitive Oxygenated Graphene with Aluminum Micro-Interdigitated Electrode Array Based Molecular Sensor for Detection of Aqueous Fluoride Anions Mahesh Soni, Tarun Arora, Robin Khosla, Pawan Kumar, Ajay Soni, Satinder K. Sharma, IEEE Sensors Journal, VOL. 16, NO. 6, MARCH 15, 2016, Impact factor 1.8; 10.1109/JSEN.2015.2505782.

  – 2015

36.  Charge Trapping and Decay Mechanism in Post Deposition Annealed Er2O3 MOS Capacitors by Nanoscopic and Macroscopic Characterization Robin Khosla, Pawan Kumar and Satinder K. Sharma; IEEE Transactions On Device and Materials Reliability, Vol. 15, No. 4, December 2015, Impact factor 1.9; 10.1109/TDMR.2015.2498310.

35.  Dual Gate Tunable and High Responsivity Graphene-Based Field Effect Transistors Mahesh Soni, Satinder Kumar Sharma, Ajay Soni; Macromol. Symp. Soft Materials, 357, pp-12-17, 2015; 10.1002/masy.201400176.

34.  Multilevel Metal-Pb (Zr0.52 Ti0. 48) O3-TiOxNy-Si for Next Generation FeRAM Technology Node Deepak K. Sharma, Robin Khosla and Satinder K. Sharma; Solid-State Electronics, vol 5, 2015, Impact factor 1.58; 10.1016/j.sse.2015.04.006.

33.  An 8 bit, 100 kS/s, Switch-Capacitor DAC SAR ADC for RFID applications Ashish Joshi, Sanjeev Manhas, Satinder K. Sharma and S. Dasgupta; Microelectronics Journal, vol 46, pp-453-461, 2015, Impact factor 0.92; 10.1016/j.mejo.2015.03.009.

32.  New Polyoxometalates Containing Hybrid Polymers and Their Potential for Nano-patterning Vishwanath Kalyani, V. S. V. Satyanarayana,Vikram Singh,Chullikkattil P. Pradeep, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves; Chemistry A Chem. Eur. J., vol 21, pp-2250-2258, 2015, Impact Factor: 5.7; 10.1002/chem.201405369.

 – 2014

31.  Effect of electrical stress on Au/Pb (Zr0.52Ti0.48) O3/TiOxNy/Si gate stack for reliability analysis of ferroelectric field effect transistors Robin Khosla, Deepak K. Sharma, Kunal Mondal and Satinder K. Sharma; Applied Physics Letters, vol 105, 2014, Impact factor 3.75; 10.1063/1.4897952.

30.  Templated Electrochemical Synthesis of Polyaniline/ZnO Coaxial Nanowires with Enhanced Photoluminescence Neelam Saurakhiya, Satinder K. Sharma, Rudra Kumar, and Ashutosh Sharma; Industrial & Engineering Chemistry Research (I & EC, Research), vol 27, 2014, Impact factor 2.25; 10.1021/ie500989m.

29.  Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography Vikram Singh, V.S.V.Satyanarayana, Nikola Batina, Israel Morales Reyes, Satinder K. Sharma, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Subrata Ghosh and Kenneth E. Gonsalves; J. Micro/Nanolith. MEMS MOEMS, Society of Photo-Optical Instrumentation Engineers (SPIE), 2014, Impact factor: 1.20; 10.1117/1.JMM.13.4.04300210.

28.  A hybrid polymeric material bearing a ferrocene based pendant organometallic functionality: synthesis and applications in nano patterning using EUV lithography V. S. V. Satyanarayana, Vikram Singh, Vishwanath Kalyani, Chullikkattil P. Pradeep, Satinder Sharma, Subrata Ghosh and Kenneth E. Gonsalves; RSC Advances Journal, RSC Adv., vol 4, pp-59817, 2014, Impact factor: 3.7; 10.1039/c4ra10648b.

27.  Design and synthesis of novel resist materials for EUVL V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth E. Gonsalves; Proc. of SPIE Vol. 9048, 90481W, CCC code:0277-786X/14/$18, 2014; 10.1117/12.2045736.

26.  Tuning of structural, optical, and magnetic properties of ultrathin and thin ZnO nanowire arrays for nano device applications Satinder K. Sharma, Neelam Saurakhiya, Sumit Barthwal, Rudra Kumar and Ashutosh Sharma; Nanoscale Research Letters, vol 9:122, 2014, Impact factor 2.55; 10.1186/1556-276X-9-122.

25.  Organic-Inorganic Hybrid Resists for EUVL Vikram Singh, Vishwanath Kalyani, V. S. V. Satynarayana, Pradeep Parameswaran, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves; Proc. of SPIE Vol. 9051, 90511W,SPIE CCC code: 0277-786X/14/$18, 2014; 10.1117/12.2041907.

24.  A Switch-Capacitor DAC Successive Approximation ADC Using Regulated Clocked Current Mirror Ashish Joshi, Satinder Sharma, Sanjeev Manhas and S. Dasgupta; International Journal of Electronics and Electrical Engineering (IJEEE), Vol.2, No.1, 2014; 10.12720/ijeee.2.1.50-55.

23.  Novel non-Chemical Amplified (n-CARs) Negative Resists for EUVL Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves; Advances in Patterning Materials and Processes Proc. of SPIE Vol. 9051, 905106, SPIE CCC code: 0277-786X/14/$18, 2014; 10.1117/12.2041183.

22.  Towards Novel non-Chemically Amplified (n-CARS) Negative Resists for Electron Beam Lithography Applications Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves; J. Mater. Chem. C, vol 2, pp-2118-2122, 2014, Impact factor 6.2; 10.1039/c3tc31826e.

21.  Optimization of processing parameters and metrology for novel NCA negative resist for NGL Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves; Proc. of SPIE Vol. 9048, 90481Y, SPIE CCC code: 0277-786X/14/$18, 2014. DOI: 10.1117/12.2045882.

 – 2013-2012

20.  PZT-PDMS composite for active damping of vibrations Satinder K. Sharma, Himani Gaur, Manish Kulkarni, Ganesh Patil, Bishakh Bhattacharya, Ashutosh Sharma; Composites Science and Technology, vol 77, pp-42-51, 2013, Impact factor 3.9; 10.1016/j.compscitech.2013.01.004.

19.  PECVD based silicon oxynitride thin ?lms for nano photonic on chip interconnects applications Satinder K. Sharma, Sumit Barthwal, Vikram Singh, Anuj Kumar, Prabhat K. Dwivedi, B. Prasad, Dinesh Kumar; Micron, vol 44, pp-339-346, 2013, Impact factor 2.1; 10.1016/j.micron.2012.08.006.

18.  Antimicrobial Properties of Electro-ChemicallyStabilized Organo-Metallic Thin Kumud Kant Awasthi, Anjali Awasthi, Kamakshi, Narain Bhoot, P. J.John, Satinder K. Sharma, and Kamlendra Awasthi; Advanced Electrochemistry, vol 6, pp-1-6, 2013, Impact factor 1.2; 10.1166/adel.2013.1013.

17.  Silicon Oxynitride Thin Films for Nano Photonic On Chip Interconnects Applications
Satinder K. Sharma, Sumit Barthwal, Vikram Singh, Anuj Kumar; Journal of Micron 2012, Impact factor 1.8; 10.101/j.micron.2012.X.002 10.101/j.micron.2012.X.002.

 –  2011

16.  Surface disordering and its correlations with properties in argon implanted CR-39 polymer Nidhi Shekhawat, Sanjeev Aggarwal,Annu Sharma, Satinder K. Sharma, S. K. Deshpande, and K. G. M. Nair; Journal of Applied Physics, vol 109, pp-083513, 2011, Impact factor 2.4; 10.1063/1.3573480.

15.  Study of Rapid Thermal Annealing on Ultra-Thin High-K HfO2 Films Properties for nano Scaled MOSFET Technology Vikram Singh, Satinder K.Sharma, Dinesh Kumar, R.K. Nahar; Microelectronics Engineering B, 2011, Impact factor 1.7; 10.1016/j.mee.2011.09.005.

14.  Frequency Dependence Studies on the Interface Trap Density and Series Resistance of HfO2 Gate Dielectric Deposited on Si Substrate: Before and After 50MeV Li3+ Ions IrradiationVikram Singh, N.Shashank, Satinder K. Sharma, Dinesh Kumar, R.K. Nahar; Nuclear Instruments and Methods in Physics Research B., 2011, Impact factor 1.2; 10.1016/j.nimb.2011.08.025.

13.  Large scale synthesis of polyaniline nanowires and their characterization Sanjeev Kumar and Satinder K. Sharma; Journal of Materials Science: Materials in Electronics, Impact factor 1.2, 2011; 10.1007/s10854-011-0583-7.

– 2010

12.  High-k Dielectric Stacks Charge Trapping for CMOS Technology Satinder K. Sharma, B.rasad and Dinesh Kumar; Material Science and Engineering B, vol 166, pp-170-173, Impact factor 2.7, 2010; 10.1016/j.mseb.2009.11.002.

11.  Templated One Step Electrodeposition of High Aspect Ratio n-type ZnO Nanowire Arrays Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma; Journal of Colloidal and Interfacial Science, 2010, Impact factor 3.5; 10.1016/j.jcis.2009.12.026.

10.  Stability and Dewetting of Metal Nanoparticles Filled Thin Polymer Films: Control of Instability Length scale and Dynamics Rabibrata Mukherjee, SomaDas, AnindyaDas,Satinder K. Sharma, Arup K. Raychaudhuri and Ashutosh Sharma; ACS NANO, Impact factor 10.0, 2010; 10.1021/nn901912d.

9.    Nickel silicide formation by electroless technique for ULSI technology Anuj Kumar, Mukesh Kumar, Amanpal Singh, Satinder Kumar, Dinesh Kumar; Microelectronic Engineering, vol 87, pp-286-289, 2010, Impact factor 1.8; 10.1016/j.mee.2009.07.021.

8.    Changes in Structural and Optical Properties of Polycarbonate Induced by Ag+ Ion Implantation Suman Bahniwal, Annu Sharma, Sanjeev Aggarwal, S.K. Deshpande, Satinder K. Sharma, K.G.M.Nair; Journal of Macromolecular Science, Part B, vol 49, no. 2, pp-259-268, 2010, Impact factor 1.0; 10.1080/00222340903352252.

7.    Large scale synthesis of cadmium selenide nanowires using template synthesis technique and their Characterization Sanjeev Kumara, Vijay Kumar, Satinder K. Sharma, S.K. Sharma, S.K. Chakarvarti; Superlattices and Microstructures, pp-1-9, 2010, Impact factor 1.3; 10.1016/j.spmi.2010.03.008.

6.    Low-temperature synthesis and characterization of cadmium sulphide nanowires grown using simple chemical reaction through the pores in an alumina template Sanjeev Kumar and Satinder K Sharma; IOP Publishing Phys. Scr., vol 82, 000000, 4pp, 2010, Impact factor 1.0; 10.1088/0031-8949/82/02/025801.

– 2009-2008

5.    Alteration of Gate Oxides Thickness for SOC Level Integration Satinder K. Sharma, B. Prasad, Dinesh Kumar and Rajkumar; Materials Science in Semiconductor Processing, vol 12, pp-99, 2009, Impact factor 1.2; 10.1016/j.mssp.2009.08.003.

4.    Growth and Characterization of Large -Scale Uniform Zinc Sulfide Nanowires by Simple Chemical Reaction Technique Sanjeev Kumar, Satinder K. Sharma; Superlattices & Microstructures, 2009, Impact factor 1.3; 10.1016/j.spmi.2009.08.008.

3.    Multiple thickness gate oxides with fluorine implantation for system on chip applications Satinder K. Sharma, B. Prasad, Dinesh Kumar, RajKumar; Vacuum, vol 83, pp-1359, 2009, Impact factor 1.5; 10.1016/j.vacuum.2009.04.045.

2.    Structural and optical characterization of ZnO thin films deposited by sol-gel method
A.Singh, A. Kumar, N.Suri, S. Kumar, M.Kumar, P.K.Khanna, D.Kumar; Journal of Optoelectronics and Advanced Materials (JOM), pp-790-793, 2009, Impact factor 0.9

1.    Surface topography and morphology characterization of PIII irradiated silicon surface Satinder K. Sharma and Sumit Barthwal; Applied Surface Science, 17552, pp-1-6, 2008, Impact factor 2.0; 10.1016/j.apsusc.2008.07.1

 

Conferences

 

  1. Sharma Satinder Kumar, Moinuddin Mohamad, Yogesh Midathala, Sharma Shivani, Sahani Manoj, et al. ; Focusing on nanoparticles based photomultiplier in n-CARs , SPIE Advanced Lithography 2020, on 21 – 25 February 2018 at San Jose, California United States (USA) (2020).
  1. Sharma Satinder Kumar, Kumar Rudra, Chauhan Manvendra, Moinuddin Mohamad, Peter Jerome, et al.; All new nickel based Metal Core Organic Cluster (MCOC) resist for N7+ node patterning, SPIE Advanced Lithography 2020, on 21 – 25 February 2018 at San Jose, California United States (USA) (2020).
  1. Satinder K. Sharma, Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Chullikkattil P. Pradeep, Subrata Ghosh, and Kenneth E. Gonsalves; Evaluation of High Resolution & Sensitivity of n-CAR Hybrid Resist for Sub-16nm or Below Technology Node SPIE Advanced Lithography 2018, on 21 – 25 February 2018 at San Jose, California United States (USA) (2018).
  1. Satinder K. Sharma, Pulikanti Guruprasad Reddy, Mohamad Ghulam Moinuddin, Subrata Ghosh, Chullikkattil P. Pradeep, and Kenneth E. Gonsalves; Helium Ion Active Novel Hybrid n-CAR Resist for Sub-10 nm Patterning Applications; submitted for presentation Symposium: SPIE Advanced Lithography 2018, at San Jose, California United States (USA) (2018).
  1. Mohamad Ghulam Moinuddin, Pulikanti Guruprasad Reddy, Satinder K Sharma , Chullikkattil P. Pradeep, Subrata Ghosh, and Kenneth E. Gonsalves; Photoresist development for sub-22 nm node technology: Polyarylenesulfonium salt as negative tone resist for electron beam lithography submitted in National Conference on Complex Engineering Systems of National Importance: Current Trends & Future Perspective, Organised by ISSE – Chandigarh Chapter & Semi-Conductor Laboratory, Department of Space and will be held on Octuber12–13, 2017, Indian School of Business, Chandigarh.
  1. Robin Khosla, and Satinder K. Sharma; Impact of Metal Electrodes on MFIS Structure Performance for NextGeneration FeRAM Applications; submitted in National Conference on Complex Engineering Systems of National Importance: Current Trends & Future Perspective, Organised by ISSE – Chandigarh Chapter & Semi-Conductor Laboratory, Department of Space and will be held on Octuber12–13, 2017, Indian School of Business, Chandigarh.
  1. Ashish Joshi, Hitesh Shrimali and Satinder K Sharma; 1.3 µVrms and 1.4 µA Capacitively Coupled Chopper Stabilized Instrumentation Amplifier for a Biomedical Data Acquisition System in 180 nm CMOS submitted in National Conference on Complex Engineering Systems of National Importance: Current Trends & Future Perspective, Organised by ISSE – Chandigarh Chapter & Semi-Conductor Laboratory, Department of Space and will be held on Octuber12–13, 2017, Indian School of Business, Chandigarh.
  1. Ashish Joshi, Indu Yadav, Satinder K. Sharma and Hitesh Shrimali, The Pole-zero Doublet: a Cascode Operational Amplifier with Cross Coupled Capacitor, MWSCAS Abu Dhabi 2016; IEEE 59th International Midwest Symposium on Circuits and Systems 16-19 October 2016, Hotel Fairmont Bab Al Bahr, Abu Dhabi, United Arab Emirates (2016).
  1. Satinder K. Sharma, Narsimha Mamidi, Rakhi Pramanick, Pawan Kumar, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves, Design and development of low-activation energy based n-CARs for next-generation EUV lithography,” accepted for presentation Symposium: SPIE Advanced Lithography 2016, held on 21 – 25 February 2016 at San Jose, California United States (USA) (2016).
  1. Pawan Kumar, Mahesh Soni, Tarun Arora, Robin Khosla and Satinder K. Sharma, Highly Sensitive SERS Sensor Based on Ag coated Self Assembled Colloidal Crystals for Detection of Contaminats presented in Water, in International Conference on Materials Science & Technology 2016 (A Global platform for high-tech materials) held on 01 -04 March, 2016 at the Conference Centre, University of Delhi, India (2016).
  1. Mahesh Soni, Tarun Arora, Pawan Kumar, Ajay Soni, Satinder K. Sharma, GO/µ–IDEs/p-Si Based Real Time Sensors for F- Detection in Natural Drinking Water, presented in 1st IEEE International Symposium on Nanoelectronic and Information System (IEEE-iNIS), 21- 23 December 2015, Indore, India (2015).
  1. Pawan Kumar, Mahesh Soni, Tarun Arora, Satinder K. Sharma, 2D Colloidal Crystals based SERS Sensors for NH3 Detection, presented in 1st IEEE International Symposium on Nanoelectronic and Information System (IEEE-iNIS), 21- 23 December 2015, Indore India (2015).
  1. Deepak K. Sharma, Robin Khosla and Satinder K. Sharma, (2014): High performance Au/PZT/TiOxNy/Si MFIS structure for next generation ferroelectric memory applications, International Conference on Condensed Matter Physics, ICCMP, 2014, Himachal Pradesh University-Shimla.
  1. Mahesh Soni, Satinder K. Sharma, Ajay Soni, (2014): Charge carrier controlling in Dual Gated Graphene Based Field Effect Transistors; presented in the International Conference on Soft Materials October, 06-10, 2014, ICSM 2014 in Jaipur India.
  1. Ashish Joshi, Satinder Sharma, Sanjeev Manhas and S. Dasgupta, (2014): DAC Successive Approximation ADC Using Clocked Current Mirror, International Conference on Advances in Electronics Engineering, Feb: 19-20, Singapore, 2014.

 

  1. Vikram Singh, V. S. V. Satyanarayana, Felipe Kessler, Francine R. Scheffer, Daniel E. Weibel, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, (2014): Optimization of processing parameters and metrology for novel NCA negative resist for NGL, presented, as a poster presentation at SPIE Advanced Lithography Symposium-2014, Extreme Ultaviolet (EUV) Lithography V, SPIE paper no, 9048-69, 2014.
  1. V. S. V. Satyanarayana, Vikram Singh, Subrata Ghosh, Satinder Sharma, Kenneth E. Gonsalves, (2014): Design and synthesis of novel resist materials for EUVL, presented, “as a poster presentation at SPIE Advanced Lithography Symposium-2014, Extreme Ultaviolet (EUV) Lithography V, SPIE paper no, 9048-67, 2014.
  1. Vikram Singh, Vishwanath Kalyani, V. S. V. Satynarayana, Pradeep Parameswaran, Subrata Ghosh, Satinder K. Sharma, Kenneth E. Gonsalves, (2014): Organic-Inorganic Hybrid Resists for EUVL, presented, as a poster presentation at SPIE Advanced Lithography Symposium-2014, Advances in Patterning Materials and Processes XXXI, SPIE paper no, 9051-71, 2014.
  1. 22. Vikram Singh, V. S. V. Satyanarayana, Satinder K. Sharma, Subrata Ghosh, Kenneth E. Gonsalves, (2014): Novel non-Chemical Amplified (n-CARs) Negative Resists for EUVL, presented, as a oral presentation at SPIE Advanced Lithography Symposium-2014, Advances in Patterning Materials and Processes XXXI, SPIE paper no, 9051-5, 2014.
  1. Vikram Singh, V. S. V. Satyanarayana, Vishwanath Kalyani, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep and Kenneth E. Gonsalves, (2014): Novel Non-Chemically Amplified (n-CARs) Resists for Next Generation Lithography (NGL) Applications, “presented, as a poster presentation at ICON-2014, Theme 06: Nanolithography / Microfluids:- Abstract No.:- 17 ; Poster ID:- P-12 (T-6)., on March 3-5, 2014 at Chandigarh, India. (Received the best poster award sponsored by RSC).

 

  1. Vikram Singh, Satinder K. Sharma, R.K. Nahar , Dinesh Kumar; (2011): Ultrathin HfO2 based CMOS for space application, presented at International conference on nano materials and Nanotechnology,18-23 December, 2011, at University of Delhi, India
  1. Neelam Saurakhiya, Satinder Kumar Sharma, Ashutosh Sharma, (2012): Radial hetrojunction formation of ZnO-Polyaniline coaxial nanowires via electrochemical route, presented at International Conference on Nanoscience and Technology (ICONSAT – 2012) January 20 to 23, 2012 at Hyderabad, India.
  1. Vikram Singh, Satinder K. Sharma, R.K. Nahar , Dinesh Kumar; (2011): Effects of Post-Deposition Annealing on the Material and Electrical Characteristics of Sputtered Ultrathin HfO2 Film on Silicon, presented in 16th International Workshop on The Physics of Semi Conductor Devices, 2011 at Indian Institute of Technology-Kanpur, India.
  1. Prabhat K. Dwivedi, Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma (2010): Chalcogenide Glass Photoresists for Grayscale Patterning at the 55th DAE Solid State Physics Symposium 2010, India.
  1. Neelam Saurakhiya, Satinder K. Sharma and Ashutosh Sharma,(2010): Polyaniline 1D Nanostructures film formation by electrochemical deposition for Biomedical Applications, at International Conference onNano Science and Technology(ICONSAT)2010,   held at IIT Bombay, Mumbai, India, 17-20,February, 2010.

 

  1. Satinder K. Sharma, Amritha Rammohan and Ashutosh Sharma,(2009): Templated electrodeposition of ZnO nanowires array for bio sensing application, Golden Jublilee Symposium on fabrication at small scale and INDO-US conference on fabrionics, organized by IIT –Kanpur, U.P. India, 9-12 December, 2009.

 

  1. Vikram Singh, Satinder Kumar, Dinesh Kumar, R.K. Nahar,(2009): Synthesis and Characterisation of Erbium Nano Particle doped High k Dielectric Thin film for Novel device Applications, at XI international conference on advanced materials (ICAM-09) at Rio de Janeiro Brazil, Sept 2009.
  1. Anuj Kumar, Mukesh Kumar, Amanpal Singh, Satinder Kumar, B. Parsad and D. Kumar (2008): Raman study on NiSi formation by Electroless for ULSI technology, Ist Rashtreeya Yuva Vaigyanik Sammelan organized by National Institute of Technology,   Kurukshetra, Haryana, India, 28-30 November, 2008.
  1. Anuj Kumar, Amanpal Singh, Satinder Kumar, Mukesh Kumar, B. Prasad and Dinesh Kumar, (2008): The evolution of phase transformation during annealing of electroless Ni-Co-P alloy thin Film, National Conference on Photonics & Material Science, Guru Jambheshwer University, Hisar, Haryana, India, October 24-25, 2008.
  1. Anuj Kumar, Amanpal Singh, Satinder Kumar, Mukesh Kumar, B. Prasad and D. Kumar (2008): Deposition and characterization of electroless Ni-Co-P alloy thin film, National conference on semiconductor materials and technology, held at Gurukula Kangri Vishwavidyalaya Haridwar India,16-18 October 2008.
  1. Amanpal Singh, Anuj Kumar, Satinder Kumar, Mukesh Kumar, P.K. Khanna and Dinesh Kumar (2008): Synthesis of nano-crystalline ZnO thin film by Sol-Gel technique, National conference on semiconductor materials and technology to be held at Gurukula Kangri   Vishwavidyalaya Haridwar India,16-18 October 2008.

 

  1. Satinder K. Sharma, Anuj Kumar, B. Prasad and Dinesh Kumar,(2007):Experimental Determination of Threshold Voltage Shift in Submicron Devices, held at 52nd DAE Solid State Physics Symposium, Department of Studies in Physics, University of Mysore, MYSORE, from 27-31 December 2007.

 

  1. Satinder K. Sharma, B. Prasad and Dinesh Kumar,(2007): Electrical Characteristics of SiOxNy/HfO2 Stack Structure for High Performance Sub- micron CMOS Devices (INCCOM-6), International Conference on Future Trends in Composite Materials and Processing, at Indian Institute of Kanpur (U.P) from December 12-14, (2007).

 

  1. Satinder K. Sharma, B. Prasad, Dinesh Kumar and Rajkumar,(2006):Role of +19F Implanted to Grow Multiple Gate Oxides for Nano-CMOS Technology, International Conference on Micro and Nanotechnology held at University of Mouloud Mammeri Of TIZI-OUZOU, ALGERIA, November 19-23  (2006).

 

  1. Satinder K. Sharma,Dinesh Kumar and B.Prasad, (2006):Effectof Post Metallization Annealing on hysterisis of C-V and G-V characteristics of PECVD deposited silicon oxynitride thin films, National Conference held at Kurukshetra University, Sep. (2006).

 

  1. Dinesh Kumar, Satinder K. Sharma, Anita Rani, B. Prasad and Mukesh Kumar, (2006): Fabrication of MOS structure by wet oxidation of MBE grown AlAs/InAS, National Conference held at Kurukshetra University, September (2006).

 

  1. Satinder K. Sharma, Anil Dutt,B. Prasad, Dinesh Kumar and P.J.George, (2006) High Frequency Simultaneous Measurement for Rapid Characterization of MIS Structure, National Conference On Recent Advances in Process Control & Instrumentation Engineering held at Kurukshetra University, February 23-25, (2006).

 

  1. Satinder K. Sharma, Rajkumar, B. Prasad, Dinesh Kumar and P.J.George,(2006) Impact of Post-metallization annealing on the Fluorinated Ultra Thin Gate Oxide in Submicron MOS Devices, Indian Microelectronics Society Conference held at Kurukshetra  University, February 17-18, (2006).

 

  1. Satinder K. Sharma,B. Prasad, Dinesh Kumar and P.J.George,(2004):Application of Plasma Immersion Ion Implantation Technique for Oxynitride Growth as a Gate Dielectric in Sub Micron MOS Devices, National Conference on Materials and Their Applications held at Kurukshetra University (2004).

 

  1. Satinder K. Sharma, B. Prasad, Dinesh Kumar and P.J.George, (2003): Silicon Oxynitride-Future Gate Material, National Conference on Materials and Related Technologies held at Thapar Institute of Engineering and Technology, Patiala, ep19-20, 2003.Published as special proceedings.