About Us

The DEL Lab exists in the Indian Institute of Technology (IIT), Mandi, Himachal Pradesh-175001, India is to serve a facility for multidisciplinary approach of research, development and applications in nanoelectronics, extreme ultraviolet lithography (EUL) resists materials for the next generation technology node, IC design and fabrication of CMOS logic and memory applications, 2D materials, Sensors & MEMS, optoelectronics systems and designs. The DEL Lab contributes to the advancement of the material design plus testing for volatile, non volatile memories, graphene, polymer nanocomposite and CNTs, FETs design and fabrications, flexible electronics include NEMS/MEMS sensors, photovoltaics, intelligent packaging, RF identification devices, bio-electronic interfaces, device prototyping along with interface between academia and semiconductor industries. The swift miniaturization and efficient high-volume processing lead to the production of more than 1000 trillion transistors every year. This extensive integration of transistors has transformed complex circuits into a simpler form of integrated circuits (ICs) with reduced cost and extending its application to a wide range of practical and affordable electronic applications. It is only because of Semiconductor devices, the world marks the arrival of the “computer age” or the “second industrial revolution.” Device Fabrication is the route, used to create IC that finds applications in medical, automobiles, industrial and consumer electronics. As a result, semiconductor devices are making contributions to every segment of the global economy and every branch of human endeavours. Device Fabrication is a multiple-step sequence of chemical, electrical, photolithographic, testing, packaging etc. processing steps after which an electronic circuit is step by step created on the bare wafer. DEL Lab performs research in nano regime non-volatile (NV) memories based on inorganic/organic composites. Apart from this, DEL Lab works in the field of new novel 1D and 2D materials, to replace the existing Technology. With an ever-evolving understanding of the underlying mechanisms that govern device performance, we can design new device structures, processes, materials to progress this field toward commercially viable, light-weight, and flexible organic electronics.

Nanofabrication

The  Device Engineering laboratory equipped with a wide variety of fabrication and research tools suitable for micro/nano-electronics and MEMS devices, including NGL Patterning, thin-film deposition, plasma and chemical etching, and characterization processes. Click Here ..

 
 
 
 
 
 
 
 
 
 
 
 
 
 
 
 
 
 
 
 

 

About Integrated Circuits

The swift miniaturization and efficient high-volume processing lead to the production of more than 1000 trillion transistors every year. This extensive integration of transistors has transformed complex circuits into a simpler form of integrated circuits (ICs) with reduced cost and extending its application to a wide range of practical and affordable electronic applications.

It is only because of Semiconductor devices, the world marks the arrival of the “computer age” or the “second industrial revolution.” Device Fabrication is the route, used to create IC that finds applications in medical, automobiles, industrial and consumer electronics.

Device Fabrication is a multiple-step sequence of chemical, electrical, photolithographic, testing, packaging etc. processing steps after which an electronic circuit is a step by step created on the bare wafer. 

C4DFED Clean Room Facility- Device Engineering Laboratory

Achievements So Far

4
Projects Completed
7
Projects Running
108
Papers Published